Low pressure chemical vapour deposition at quasi-high flow
- 1 April 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 114 (3) , 295-309
- https://doi.org/10.1016/0040-6090(84)90127-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- P‐Doped Polysilicon Film Growth TechnologyJournal of the Electrochemical Society, 1982
- Semi-insulating polysilicon (SIPOS) deposition in a low pressure CVD reactor: I. Growth kineticsJournal of Crystal Growth, 1981
- Low pressure deposition of polycrystalline silicon from silaneJournal of Crystal Growth, 1981
- Influence of crystal structure on the luminescence of ions with s2 configurationJournal of Solid State Chemistry, 1977