Electroless copper deposition solution induced chemical changes in low-k fluorinated dielectrics
- 30 April 1999
- journal article
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 2 (1) , 19-22
- https://doi.org/10.1016/s1369-8001(98)00052-3
Abstract
No abstract availableKeywords
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