Electron-cyclotron-resonant microwave plasma system for thin-film deposition
- 1 March 1986
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 57 (3) , 493-496
- https://doi.org/10.1063/1.1138915
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- The effects of deposition parameters on a-Si:H films fabricated by microwave glow discharge techniquesJournal of Non-Crystalline Solids, 1983
- Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasmaJournal of Non-Crystalline Solids, 1983
- Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance PlasmaJapanese Journal of Applied Physics, 1983
- Measurement of Power Transfer Efficiency from Microwave Field to Plasma under ECR ConditionJapanese Journal of Applied Physics, 1977