Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique
- 6 November 2001
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 185 (1-2) , 123-133
- https://doi.org/10.1016/s0169-4332(01)00774-7
Abstract
No abstract availableKeywords
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