Study of the sputtering process with Rutherford backscattering
- 15 September 1976
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 137 (3) , 553-557
- https://doi.org/10.1016/0029-554x(76)90475-4
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Model calculations of profiles and dose of high dose ion implants influenced by sputteringNuclear Instruments and Methods, 1976
- Study of the annealing behaviour of high dose implants in silicon and germanium crystalsRadiation Effects, 1975
- Microanalysis of Materials by Backscattering SpectrometryScience, 1972
- Energy Spectra of keV Backscattered Protons as a Probe for Surface-Region StudiesCanadian Journal of Physics, 1971
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Sputtering experiments in the high energy regionNuclear Instruments and Methods, 1961