Intensity analysis of XPS spectra to determine oxide uniformity: Application to SiO2/Si interfaces
- 1 October 1980
- journal article
- Published by Elsevier in Surface Science
- Vol. 99 (3) , 681-688
- https://doi.org/10.1016/0039-6028(80)90561-0
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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