Reactive evaporation of thin titanium nitride films in ultrahigh vacuum and their friction and wear behavior as a function of contact stress
- 1 June 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 173 (1) , 19-37
- https://doi.org/10.1016/0040-6090(89)90534-8
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- Summary Abstract: Properties of TiN thin films on several substrate plates with a high current ion mixing machineJournal of Vacuum Science & Technology A, 1987
- Ion beam modification of TiN films during vapor depositionMaterials Science and Engineering, 1987
- Adhesion and toughness of protective coatingsJournal of Vacuum Science & Technology A, 1987
- Vacuum annealing studies of the structure and of mechanical properties of thin titanium nitride films deposited by activated reactive evaporationThin Solid Films, 1986
- Some features of the deformation and fracture of carbides, borides and nitrides under friction in the temperature range 20–1400 °CJournal of the Less Common Metals, 1986
- TiN coating adhesion studies using the scratch test methodJournal of Vacuum Science & Technology A, 1985
- Ti–N phases formed by reactive ion platingJournal of Vacuum Science & Technology A, 1985
- Adhesion of titanium nitride coatings on high-speed steelsJournal of Vacuum Science & Technology A, 1985
- Investigations on mechanical behaviour of brittle wear-resistant coatings I. Experimental resultsThin Solid Films, 1983
- Processes of the activated reactive evaporation type and their tribological applicationsThin Solid Films, 1983