Formation of compounds by high-flux nitrogen ion implantation in titanium
- 1 February 1986
- journal article
- Published by Springer Nature in Journal of Materials Science
- Vol. 21 (2) , 395-404
- https://doi.org/10.1007/bf01145500
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- High fluence implantation of nitrogen ions into titaniumMaterials Science and Engineering, 1985
- Modification of Concentration Profiles in Iron and Aluminium by High-Fluence Implantation of Nitrogen and Boron IonsPhysica Status Solidi (a), 1984
- Applications of ion implantation in metalsThin Solid Films, 1983
- Formation of compounds by metalloid ion implantation in ironNuclear Instruments and Methods in Physics Research, 1983
- Titanium nitride films prepared by ion implantationThin Solid Films, 1981
- Synthesis of titanium nitrides by activated reactive evaporationThin Solid Films, 1980
- Ion bombardment of group IV elemental metal and synthetic nitride filmsThin Solid Films, 1979
- Formation of chemical compounds by ion bombardment of thin transition metal filmsPhysica Status Solidi (a), 1978
- Phase transformations at bombardment of thin films with ionsPhysica Status Solidi (a), 1975
- New atomic form factors for beryllium and boronActa Crystallographica, 1957