Temperature dependence of profile tailing and segregation in SIMS analysis of As in Si and SiO2 with oxygen primary ions
- 1 April 1986
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 15 (1-6) , 198-200
- https://doi.org/10.1016/0168-583x(86)90284-3
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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