Bonding and Thermal Reactivity in Thin a-SiC:H Films Grown by Methylsilane CVD
- 1 November 1997
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 101 (45) , 9195-9205
- https://doi.org/10.1021/jp9718459
Abstract
No abstract availableKeywords
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