Selective etching and epitaxial refilling of silicon wells in the system SiH4/HCl/H2
- 31 December 1975
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 31, 312-316
- https://doi.org/10.1016/0022-0248(75)90146-3
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- The combination of two growth methods for the epitaxial deposition of silicon films on insulating substratesJournal of Crystal Growth, 1972
- Selective Epitaxial Deposition of SiliconNature, 1962
- Epitaxial Silicon Films by the Hydrogen Reduction of SiCl[sub 4]Journal of the Electrochemical Society, 1961