Reactive magnetron sputtering deposition of TiN films. I. Influence of the substrate temperature on structure, composition and morphology of the films
- 31 January 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 88 (1-3) , 17-27
- https://doi.org/10.1016/s0257-8972(96)02870-8
Abstract
No abstract availableThis publication has 27 references indexed in Scilit:
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