Evaluation of amorphous (Mo, Ta, W)SiN diffusion barriers for 〈Si〉|Cu metallizations
- 1 December 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 236 (1-2) , 319-324
- https://doi.org/10.1016/0040-6090(93)90689-m
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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