Resist processes for hybrid (electron-beam/deep ultraviolet) lithography

This publication has 8 references indexed in Scilit:

• Modulated-temperature DSC (MT-DSC): a new technique for the extensive thermal characterization of complex chemically amplified systems
  Published by SPIE-Intl Soc Optical Eng ,1997
• A heavy ion implanted pocket 0.10 μm n-type metal–oxide–semiconductor field effect transistor with hybrid lithography (electron-beam/deep ultraviolet) and specific gate passivation process
  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
• Development of two new positive DUV photoresists for use with direct-write e-beam lithography
  Published by SPIE-Intl Soc Optical Eng ,1996
• High resolution studies on Hoechst AZ PN114 chemically amplified resist
  Microelectronic Engineering, 1996
• Optimization of CD control in DUV positive resists: influence of photoresist viscoelastic properties on PEB conditions
  Published by SPIE-Intl Soc Optical Eng ,1995
• Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25μm CMOS
  Microelectronic Engineering, 1995
• Evaluation of a positive tone chemically amplified deep UV resist for E-beam applications
  Microelectronic Engineering, 1994
• Relationship between resist performance and diffusion in chemically amplified resist systems
  Published by SPIE-Intl Soc Optical Eng ,1993