Treatment of Ionized Impurity Scattering in Degenerate Semiconductors. Combination of the Variational and Perturbational Technique in the Partial-Wave Method
- 1 September 1963
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 131 (5) , 2033-2035
- https://doi.org/10.1103/physrev.131.2033
Abstract
Using the variational technique for the calculation of the zeroth-order phase shift and the perturbational technique for obtaining the higher order phase shifts, an analytic expression is derived for the total scattering cross section of ionized impurity scattering in degenerate semiconductors. The formula obtained may be looked upon as resulting from a refinement of the first Born approximation and its significance lies in the fact that it is valid in a doping region where neither the uncorrected Born approximation nor the simplest form of the partial-wave method (based on using only a variationally determined zeroth-order phase shift) can be applied for the calculation of the resistivity of ionized impurity scattering.Keywords
This publication has 4 references indexed in Scilit:
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- Treatment of Ionized Impurity Scattering in Degenerate Semiconductors. Application of the Variational Technique in the Partial-Wave MethodPhysical Review B, 1962
- Effect of Impurity-Core on Carrier Mobility in Heavily Doped GermaniumJournal of the Physics Society Japan, 1961
- XCIV. Scattering of electrons and holes by charged donors and acceptors in semiconductorsJournal of Computers in Education, 1955