A contribution to the flow behaviour of thin polymer films during hot embossing lithography
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- 1 August 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 56 (3-4) , 311-332
- https://doi.org/10.1016/s0167-9317(01)00569-x
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Flow behaviour of thin polymer films used for hot embossing lithographyMicroelectronic Engineering, 2000
- Step and stamp imprint lithography using a commercial flip chip bonderPublished by SPIE-Intl Soc Optical Eng ,2000
- New polymer materials for nanoimprintingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithographyMicroelectronic Engineering, 2000
- Novel linear and crosslinking polymers for nanoimprinting with high etch resistanceMicroelectronic Engineering, 2000
- Large scale nanolithography using nanoimprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999
- Wafer-scale sub-micron lithographyApplied Physics Letters, 1999
- Problems of the nanoimprinting technique for nanometer scale pattern definitionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Hot embossing in polymers as a direct way to pattern resistMicroelectronic Engineering, 1998
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997