Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD
Open Access
- 1 January 2000
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 69-70, 278-283
- https://doi.org/10.1016/s0921-5107(99)00308-6
Abstract
No abstract availableKeywords
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