Quantitative investigation of factors influencing the efficiency of development of electron beam resists
- 30 November 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 26 (3-4) , 141-153
- https://doi.org/10.1016/0167-9317(95)00003-8
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Disentanglement and crazing in glassy polymersMacromolecules, 1990
- Electron-beam-resist materials with enhanced dry etch resistancePolymer, 1989
- Optimal developer selection for negative acting resistsPolymer Engineering & Science, 1986
- Polymers in electron beam and X-Ray lithographyProgress in Polymer Science, 1983
- LithographyRadiation Physics and Chemistry (1977), 1981
- Dissolution dynamics of some polymers: Solvent‐polymer boundariesPolymer Engineering & Science, 1980
- An Interference Microscope for the Study of Inhomogeneous MediaJournal of Scientific Instruments, 1948