Effect of heat treatment on the bulk diffusion length of EFG ribbon silicon
- 1 March 1983
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 26 (3) , 247-250
- https://doi.org/10.1016/0038-1101(83)90090-4
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Improved spatial resolution diffusion length measurements in imperfect siliconJournal of Applied Physics, 1982
- Silicon-silicon interfacesApplied Physics Letters, 1982
- The growth of EFG silicon ribbonsJournal of Crystal Growth, 1977
- Measurement of diffusion length in solar cellsJournal of Applied Physics, 1974