Anisotropic ECR etching of benzocyclobutene
- 26 October 1995
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 31 (22) , 1919-1921
- https://doi.org/10.1049/el:19951321
Abstract
Anisotropic, high rate etching of benzocyclobutene (BCB) with smooth surfaces and sidewalls has heen achieved in a SF6/O2/Ar electron cyclotron resonance (ECR)-generated plasma. BCB sidewall profiles, etch rates, and selectivity to photoresist are evaluated against SF6:O2 ratio, pressure, microwave power, and RF power.Keywords
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