Thermal stresses in square-patterned GaAs/Si: A finite-element study
- 23 December 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (26) , 3428-3430
- https://doi.org/10.1063/1.105697
Abstract
The effect of free edges on the thermal stress distribution in square-patterned GaAs/Si (100) is studied by three-dimensional finite-element elastic analysis. The results are discussed in comparison with previous analytical and numerical calculations. Finally the stress in the most important central portion of the square is calculated as a function of width to thickness ratio in the range 1 to 40. Results are presented in a form appropriate for interpretation of 4.2-K photoluminescence (PL) measurements and device optimization.Keywords
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