Ion-implant-enhanced reflow of phosphosilicate glass films
- 1 December 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 181 (1) , 95-100
- https://doi.org/10.1016/0040-6090(89)90476-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Rapid Heating Reflow of Phosphosilicate Glass Enhanced by As Ion ImplantationJapanese Journal of Applied Physics, 1986
- Planarization of Phosphorus‐Doped Silicon DioxideJournal of the Electrochemical Society, 1981
- A Scanning Electron Microscope Investigation of Glass Flow in MOS Integrated Circuit FabricationJournal of the Electrochemical Society, 1974
- Processes for multilevel metallizationJournal of Vacuum Science and Technology, 1974
- Interaction Between Phosphosilicate Glass Films and WaterJournal of the Electrochemical Society, 1974