Relation of deposition conditions of Ti-N films prepared by d.c. magnetron sputtering to their microstructure and macrostress
- 1 October 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 60 (1-3) , 484-488
- https://doi.org/10.1016/0257-8972(93)90137-d
Abstract
No abstract availableKeywords
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