Unintentional incorporation of contaminants during chemical vapour deposition of silicon carbide
- 31 January 1995
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 29 (1-3) , 134-137
- https://doi.org/10.1016/0921-5107(94)04021-u
Abstract
No abstract availableKeywords
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