Direct writing of ZrO2on a sub-10 nm scale using an electron beam
- 14 November 2003
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 15 (1) , 158-162
- https://doi.org/10.1088/0957-4484/15/1/031
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Sub-10 nm Electron Beam Nanolithography Using Spin-Coatable TiO2 ResistsNano Letters, 2003
- Growth and properties of sputtered zirconia and zirconia–silica thin filmsThin Solid Films, 2003
- Comparative study of sputtered and spin-coatable aluminum oxide electron beam resistsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Structure and stability of ultrathin zirconium oxide layers on Si(001)Applied Physics Letters, 2000
- Effect of Chelating Agents on High Resolution Electron Beam Nanolithography of Spin-Coatable Al2O3 Gel FilmsJapanese Journal of Applied Physics, 1999
- Electrochemical vapor deposition synthesis and oxygen permeation properties of dense zirconia–yttria–ceria membranesSolid State Ionics, 1997
- Ceramic Fuel CellsJournal of the American Ceramic Society, 1993
- Ceramic Thin Films: Fabrication and ApplicationsScience, 1990
- Reactive magnetron sputtered zirconium oxide and zirconium silicon oxide thin filmsJournal of Vacuum Science & Technology A, 1989
- Optical coatings for laser fusion applicationsThin Solid Films, 1980