The structure and colour of some nitride coatings
- 2 January 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 135 (1) , 73-85
- https://doi.org/10.1016/0040-6090(86)90090-8
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Relation between the hue and composition of TiCxNy films prepared using multiple hollow cathode discharge ion platingThin Solid Films, 1985
- Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target modeThin Solid Films, 1984
- Properties and structure of carbon excess TixC1−x deposited onto molybdenum by magnetron sputteringThin Solid Films, 1983
- Color of titanium nitride prepared by reactive dc magnetron sputteringJournal of Vacuum Science and Technology, 1982
- Influence of substrate bias on composition and structure of reactively r.f.-sputtered TiC filmsThin Solid Films, 1981
- Residual compressive stress in sputter-deposited TiC films on steel substratesThin Solid Films, 1981
- TiN and TiC coating on cemented carbides by ion platingThin Solid Films, 1978
- Formation of thick titanium carbide films by the hollow cathode discharge reactive deposition processThin Solid Films, 1978
- Hard decorative TiN coatings by ion platingThin Solid Films, 1977
- Über die binären Systeme des Titans mit den Elementen Stickstoff, Kohlenstoff, Bor und BerylliumZeitschrift für anorganische und allgemeine Chemie, 1949