Influence of substrate bias on composition and structure of reactively r.f.-sputtered TiC films
- 19 June 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 80 (1-3) , 77-83
- https://doi.org/10.1016/0040-6090(81)90209-1
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Incorporation of rare gases in sputtered amorphous metal filmsJournal of Vacuum Science and Technology, 1977
- Effect of ion bombardment during deposition on thick metal and ceramic depositsJournal of Vacuum Science and Technology, 1974
- Proposed Model for the Composition of Sputtered Multicomponent Thin FilmsJournal of Applied Physics, 1969
- Gas Incorporation into Sputtered FilmsJournal of Applied Physics, 1967