Mechanical properties of cubic boron nitride film on Si prepared by ECR plasma
- 1 February 1993
- journal article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 2 (1) , 1-4
- https://doi.org/10.1088/0963-0252/2/1/001
Abstract
Boron nitride films were deposited using electron cyclotron resonance (ECR) plasma and RF substrate bias. The authors investigated the mechanical properties and adherence of BN films for various self-bias. The structure and stress of BN films depended on the negative self-bias. These results are analysed by a peening mechanism of compressive stress in films.Keywords
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