Surface and bulk diffusion of adsorbed nickel on ultrathin thermally grown silicon dioxide
- 1 April 1992
- journal article
- Published by Elsevier in Surface Science
- Vol. 265 (1-3) , 102-110
- https://doi.org/10.1016/0039-6028(92)90491-n
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
- Microscopic structure of the/Si interfacePhysical Review B, 1988
- Structure and reactivity of the system Si/Sio2/Pd: A combined XPS, UPS and HREELS studySurface Science, 1987
- Influence of thininterlayers on chemical reaction and microstructure at the Ni/Si(111) interfacePhysical Review B, 1986
- Thermodynamic considerations in refractory metal-silicon-oxygen systemsJournal of Applied Physics, 1984
- Thermal formation of SiO2 films over NiSi, NiSi2 and CoSi2 via silicide decompositionThin Solid Films, 1983
- Interface effects in the formation of silicon oxide on metal silicide layers over silicon substratesJournal of Applied Physics, 1983
- Formation of Ultrathin Single-Crystal Silicide Films on Si: Surface and Interfacial Stabilization of Si-NiEpitaxial StructuresPhysical Review Letters, 1983
- Surface migration of nickel on carbon, silicon dioxide, and aluminum oxideThe Journal of Physical Chemistry, 1982
- A model of supported metal catalyst sintering I. Development of modelJournal of Catalysis, 1974
- Growth kinetics and the size distributions of supported metal crystallitesJournal of Catalysis, 1973