Nucleation, Growth and Microstructure of Vapour Deposited Tin Film on NaCl Single Crystal Substrate
- 1 September 1978
- journal article
- Published by Physical Society of Japan in Journal of the Physics Society Japan
- Vol. 45 (3) , 930-935
- https://doi.org/10.1143/jpsj.45.930
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- Resistivity and temperature coefficient of resistivity of tin filmsJournal of Materials Science, 1977
- Effect of grain-boundary scattering on the electrical resistivity of indium filmsJournal of Materials Science, 1976
- Residual crystallinity of vapor-deposited tin filmsThin Solid Films, 1974
- Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External SurfacesPhysical Review B, 1970