Behavior of oxygen in the crystal formation and heat treatment of silicon heavily doped with antimony
- 1 April 1986
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 59 (7) , 2562-2565
- https://doi.org/10.1063/1.337005
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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