Metal Organic Chemical Vapor Deposition (MOCVD) Perspectives and Prospects
- 1 August 1989
- journal article
- review article
- Published by Wiley in Angewandte Chemie International Edition in English
- Vol. 28 (8) , 1110-1120
- https://doi.org/10.1002/anie.198911101
Abstract
Review: Thin film epitaxial semiconductor structures of widely varying but controlled compositions and thickness can be prepared using MOCVD. The performance of the method is gauged against molecular beam epitaxy (MBE) and spray pyrolysis, and comment is made on the direction in which this area of research is going, for example, towards the processing of high‐Tc superconductors and ferroelectric oxides.Keywords
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