Transient Processing of Titanium Silicides in a Non-Isothermal Reactor
- 1 January 1984
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Diffusion in SolidsPublished by Springer Nature ,2016
- Short Time Annealing of Coevaporated Tungsten Silicide FilmsJournal of the Electrochemical Society, 1984
- Formation of titanium silicides by fast radiative processingApplied Physics Letters, 1984
- Fast radiative processing of titanium silicides under vacuumMaterials Letters, 1984
- Incoherent radiative processing of titanium silicidesThin Solid Films, 1984
- Kinetics of TiSi2 formation by thin Ti films on SiJournal of Applied Physics, 1983
- Co2Si, CrSi2, ZrSi2 and TiSi2 formation studied by a radioactive 31Si marker techniqueThin Solid Films, 1982
- Thin film interaction between titanium and polycrystalline siliconJournal of Applied Physics, 1980
- Solid state reactions in titanium thin films on siliconThin Solid Films, 1976
- Implanted noble gas atoms as diffusion markers in silicide formationThin Solid Films, 1975