Response of thermal filaments in VO2 to laser−produced thermal perturbations
- 1 April 1975
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 26 (7) , 355-357
- https://doi.org/10.1063/1.88176
Abstract
The response of thermal filaments in thin films of VO2 to small thermal perturbations induced by a He−Ne laser has been measured. With the aid of additional noise spectrum measurements the senstivity of a planar device with a 127−μ gap between electrodes is estimated to be approximately 0.6×10−9 W/(Hz)1/2 at 40 kHz. These devices appear, therefore, to be attractive as fast thermal detectors and may have applications as elements in high−density arrays. Radiance profiles of a thermal filament are also given.Keywords
This publication has 5 references indexed in Scilit:
- Iron Oxide See-Through PhotomasksJournal of the Electrochemical Society, 1973
- A thin-film inductance using thermal filamentsIEEE Transactions on Electron Devices, 1970
- Thermal filaments in vanadium dioxideIEEE Transactions on Electron Devices, 1969
- Preparation and Properties of Vanadium Dioxide FilmsJournal of the Electrochemical Society, 1968
- REACTIVELY SPUTTERED VANADIUM DIOXIDE THIN FILMSApplied Physics Letters, 1967