Growth of homoepitaxial silicon at low temperatures using silane-helium mixtures
- 1 March 1971
- journal article
- research article
- Published by Springer Nature in Metallurgical Transactions
- Vol. 2 (3) , 743-746
- https://doi.org/10.1007/bf02662730
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Low-Temperature Epitaxial Growth of Single Crystalline Silicon from SilaneJournal of the Electrochemical Society, 1969
- Epitaxial Growth of Silicon from the Pyrolysis of Monosilane on Silicon SubstratesJournal of the Electrochemical Society, 1963