Atomic bonding in amorphous hydrogenated silicon carbide alloys: A statistical thermodynamic approach
- 15 November 1992
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 46 (20) , 13119-13130
- https://doi.org/10.1103/physrevb.46.13119
Abstract
The free-energy model (FEM) previously developed for predicting the bonding in amorphous covalent alloys has been extended to include tetrahedra, the fundamental structural units in the a- alloys under consideration. It is proven that the tetrahedron probabilities P(i) can be obtained by randomly distributing, according to statistics, the bonds predicted by the FEM among the possible Si- and C-centered tetrahedra. The short-range order present in these alloys therefore corresponds, in general, to partial chemical ordering (CO) with a homogeneous dispersion of the bonds among the available tetrahedra. The nature of the CO predicted for these a- alloys is shown to vary with alloy composition. For example, Si-C bonds are favored over Si-Si and C-C bonds in stoichiometric alloys, Si-Si and C-H bonds are favored over Si-C and Si-H bonds in Si-rich alloys, while Si-C and C-H bonds are favored over C-C and Si-H bonds in C-rich alloys. Detailed predictions are presented for the bond fractions, tetrahedron probabilities, and tetrahedral and polymeric volume fractions in a- alloys and also in a- alloys with both high H content and lower H content. In the high-H-content alloys, C is predicted to be present primarily in and units, in good agreement with experiment, and a significant polymeric component is predicted to be present. In the lower-H-content alloys, on the other hand, more Si-C bonds and a smaller polymeric component are predicted. It is therefore demonstrated that the H content plays a dominant role in controlling the optical and electronic properties of these technologically important alloys. The simplest way of improving the usefulness of these alloys is to lower the H content, thereby promoting the random bonding of C and H atoms in the amorphous Si network.
Keywords
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