On the relation between deposition conditions and (mechanical) stress in plasma silicon nitride layers
- 1 July 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 129 (3-4) , 239-247
- https://doi.org/10.1016/0040-6090(85)90051-3
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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