Effects of X-ray mask structures and processes on X-ray mask distortion
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 309-312
- https://doi.org/10.1016/0167-9317(90)90120-i
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Influence of thin film thickness variations on pattern fidelity of X-ray masksMicroelectronic Engineering, 1986
- Mask Technology For X-Ray Step-And-Repeat SystemPublished by SPIE-Intl Soc Optical Eng ,1986