Determination of Young's moduli of micromechanical thin films using the resonance method
- 1 December 1992
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 35 (2) , 153-159
- https://doi.org/10.1016/0924-4247(92)80154-u
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Optically activated silicon microresonator transducers: An assessment of material propertiesSensors and Actuators A: Physical, 1991
- Measuring stiffnesses and residual stresses of silicon nitride thin filmsJournal of Electronic Materials, 1990
- Mechanical properties of thin filmsMetallurgical Transactions A, 1989
- Optically Excited And Interrogated Micromechanical Silicon Cantilever StructurePublished by SPIE-Intl Soc Optical Eng ,1987
- Young’s modulus measurements of thin films using micromechanicsJournal of Applied Physics, 1979
- Local Stress Measurement in Thin Thermal SiO2 Films on Si SubstratesJournal of Applied Physics, 1972
- Ultrasonic Pulse Echoes in Vacuum-Deposited Silver FilmsJapanese Journal of Applied Physics, 1971
- Miniaturization of Tuning ForksScience, 1968
- Thermal Expansion Coefficient of a Pyrolitically Deposited Silicon Nitride FilmJapanese Journal of Applied Physics, 1967