Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
- 20 October 2001
- journal article
- Published by Elsevier in Materials Science and Engineering: C
- Vol. 16 (1-2) , 59-64
- https://doi.org/10.1016/s0928-4931(01)00299-5
Abstract
No abstract availableThis publication has 23 references indexed in Scilit:
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