Electronic and atomic structure of a Co silicide-Si contact system

Publisher Website

10 January 1990

journal article
Published by Elsevier in Vacuum

Vol. 41 (4) , 875-877
https://doi.org/10.1016/0042-207x(90)93809-w

Abstract

No abstract available

Keywords

ATOMIC STRUCTURE

This publication has 3 references indexed in Scilit:

A new application of soft X-ray spectroscopy to a non-destructive analysis of a film/substrate contact system: Carbonized-layer (ultra-thin-film)/Si(100)
Surface Science, 1988
Transistor action in Si/CoSi2/Si heterostructures
Applied Physics Letters, 1985
Bonding and structure of Co ${Si}_{2}$ and Ni ${Si}_{2}$
Physical Review B, 1983