Electron irradiation of polymerisable langmuir‐blodgett multilayers as model resists for electron‐beam lithography
- 1 December 1985
- journal article
- Published by Wiley in British Polymer Journal
- Vol. 17 (4) , 360-363
- https://doi.org/10.1002/pi.4980170408
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Formation of stable Langmuir-Blodgett multilayers from oxiran carboxylic acidsThin Solid Films, 1985
- Recent improvements in monomolecular resistsThin Solid Films, 1980
- Polymerized monomolecular layers: A new class of ultrathin resins for microlithographyThin Solid Films, 1980
- Electron irradiation of polymers and its application to resists for electron-beam lithographyCritical Reviews in Solid State and Materials Sciences, 1979
- Energy dissipation in a thin polymer film by electron beam scatteringJournal of Applied Physics, 1974
- Fundamental aspects of electron beam lithography. I. Depth-dose response of polymeric electron beam resistsJournal of Applied Physics, 1973
- Determination of Kilovolt Electron Energy Dissipation vs Penetration Distance in Solid MaterialsJournal of Applied Physics, 1971
- Polymeric Electron Beam ResistsJournal of the Electrochemical Society, 1969