Deposition of polycrystalline silicon films on metal substrates under ultra-high vacuum
- 1 September 1979
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 47 (3) , 384-388
- https://doi.org/10.1016/0022-0248(79)90203-3
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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