U.v.-irradiation of thin films of polystyrene derivatives: formation of carboxylic group and crosslinking from 4-trimethylsilylmethyl substituent
- 30 November 1996
- Vol. 37 (24) , 5525-5528
- https://doi.org/10.1016/s0032-3861(96)00438-7
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Selective oxidation of poly(4‐methylstyrene)Journal of Polymer Science Part A: Polymer Chemistry, 1995
- On the fate of the phenyl ring in polystyrene photooxidationMacromolecules, 1994
- Polystyrene photooxidation. 1. Identification of the IR-absorbing photoproducts formed at short and long wavelengthsMacromolecules, 1992
- Positively charged surface potential of polymer films after excimer laser ablation: Application to selective-area electroless plating on the ablated filmsApplied Physics Letters, 1992
- Fluorescent micropattern formation on polymer surface by laser ablationApplied Physics Letters, 1991
- Selective Dyeing of Organopolysilane Films Patterned by Ultra-violet Light IrradiationChemistry Letters, 1991
- Light-Directed, Spatially Addressable Parallel Chemical SynthesisScience, 1991
- Photoinduced Electron-Transfer Reactions of Poly(4-trimethylsilylmethylstyrene) in the Presence of PolycyanobenzenesChemistry Letters, 1990
- Substituent effects of the groups CH2M(CH3)3(M = C to Pb) and M(CH3)3(M = Si to Pb) from proton and carbon-13 chemical shift measurements on 4-substituted styrenesJournal of the Chemical Society, Perkin Transactions 2, 1977
- One and two-photon photochemistry in rigid solutions of durene in 3-methylpentane at 77°KChemical Physics Letters, 1971