New transparent conducting ZnO–In2O3–SnO2 thin films prepared by magnetron sputtering
- 1 April 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 317 (1-2) , 318-321
- https://doi.org/10.1016/s0040-6090(97)00547-6
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 11 references indexed in Scilit:
- Preparation of transparent and conductive In2O3–ZnO films by radio frequency magnetron sputteringJournal of Vacuum Science & Technology A, 1996
- New multicomponent transparent conducting oxide films for transparent electrodes of flat panel displaysJournal of Vacuum Science & Technology A, 1996
- New transparent conducting MgIn2O4Zn2In2O5 thin films prepared by magnetron sputteringThin Solid Films, 1995
- Highly Transparent and Conductive Zn2In2O5 Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1995
- Properties of transparent zinc-stannate conducting films prepared by radio frequency magnetron sputteringJournal of Vacuum Science & Technology A, 1995
- Highly Transparent and Conductive Zinc-Stannate Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1994
- Preparation of Cd1−xYxSb2O6 thin film on glass substrate by radio frequency sputteringApplied Physics Letters, 1994
- Preparation of MgIn2O4-X Thin Films on Glass Substrate by RF SputteringJapanese Journal of Applied Physics, 1993
- Electron Microscopic Study of the 3 SnO2 ·2 In2 O3 Intermediate CompoundPhysica Status Solidi (a), 1992
- The Electrical and Optical Properties of the ZnO-SnO2 Thin Films Prepared by RF Magnetron SputteringPhysica Status Solidi (a), 1992