Synchrotron Radiation Lithography for DFB Laser Gratings
- 1 November 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (11R)
- https://doi.org/10.1143/jjap.28.2333
Abstract
The synchrotron radiation lithography process of grating fabrication for distributed feedback (DFB) laser diodes is described. By finely controlling the field size in electron beam writing of the X-ray mask, the grating period can be arbitrarily varied with an accuracy of less than 0.1 nm . Gratings of 0.24-µm period with a λ/4 shift are formed in the Ta absorber X-ray mask, and transferred to the laser substrate by SR exposure. This process is successfully applied to the fabrication of 20-wave-length DFB-LD arrays.Keywords
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