Formation of CoSi2 and TiSi2 on narrow poly-Si lines
- 30 September 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 14 (3-4) , 327-339
- https://doi.org/10.1016/0167-9317(91)90016-7
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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