cw laser assisted diffusion and activation of tin in GaAs from a SnO2/SiO2 source
- 1 January 1981
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 52 (1) , 227-229
- https://doi.org/10.1063/1.328480
Abstract
A new technique for doping GaAs with Sn from a spin‐on SnO2/SiO2 source is described. Sn is first introduced in the GaAs substrate by a slow thermal ramp. Subsequent diffusion and activation of Sn is accomplished with a cw scanning laser. Results for laser power below and above the melting power of the substrate are presented. Transmission electron microscopy and electron diffraction patterns indicate that a chemical reaction involving the formation of a tin‐arsenide compound occurs during the diffusion process.This publication has 4 references indexed in Scilit:
- Thermal diffusion of tin in GaAs from a spin-on SnO2/SiO2 sourceApplied Physics Letters, 1980
- Tin Diffusion from Doped Oxides for Fabricating GaAs Microwave DevicesJapanese Journal of Applied Physics, 1980
- Temperature distributions produced in semiconductors by a scanning elliptical or circular cw laser beamJournal of Applied Physics, 1980
- A laser-scanning apparatus for annealing of ion-implantation damage in semiconductorsApplied Physics Letters, 1978