Formation of thin film dielectrics by remote plasma-enhanced chemical-vapor deposition (remote PECVD)
- 1 October 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 39 (1-4) , 33-56
- https://doi.org/10.1016/0169-4332(89)90418-2
Abstract
No abstract availableKeywords
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