A Weibull distribution-based new approach to represent hot carrier degradation in threshold voltage of MOS transistors
- 29 February 2004
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 48 (2) , 217-223
- https://doi.org/10.1016/j.sse.2003.07.001
Abstract
No abstract availableKeywords
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